首页> 外文会议>Conference on Silicon-Based and Hybrid Optoelectronics Ⅳ Jan 23-24, 2002, San Jose, USA >Fabrication of aperiodic gratings on Silicon-On-Insulator (SOI) rib waveguides using e-beam lithography
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Fabrication of aperiodic gratings on Silicon-On-Insulator (SOI) rib waveguides using e-beam lithography

机译:使用电子束光刻技术在绝缘体上硅(SOI)肋形波导上制造非周期性光栅

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摘要

A technique for fabricating aperiodic Bragg gratings in rib waveguides on Silicon-On-Insulator (SOI) is presented. The technique allows flexibility in defining various characteristics of aperiodic gratings so that a full range of optical grating filters can be realized. The fabrication process comprises optical and electron-beam (e-beam) lithography followed by a liftoff and a single Reactive Ion Etch (RIE) to simultaneously produce the waveguide and the embedded grating structure.
机译:提出了一种在绝缘体上硅(SOI)上的肋形波导中制造非周期性布拉格光栅的技术。该技术允许灵活地定义非周期性光栅的各种特性,从而可以实现整个范围的光栅滤波器。制造过程包括光学和电子束(e-beam)光刻,然后进行剥离和单个反应离子刻蚀(RIE),以同时生产波导和嵌入式光栅结构。

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