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首页> 外文会议>Conference on Silicon for the Chemical Industry VI; 20020617-20020621; Loen; NO >Direct reactions of silicon with nanosized copper and copper compounds as catalyst precursors
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Direct reactions of silicon with nanosized copper and copper compounds as catalyst precursors

机译：硅与纳米级铜和铜化合物作为催化剂前体的直接反应

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摘要

Conventional fluidized-bed Direct Reactions of silicon are typically run with 45 - 500 micron silicon and 1 - 5 micron copper and promoter sources. This difference in particle size results in marked differences in the escape velocities of silicon and catalyst/ promoters from the reactor. Preferential elutriation of the finer particles occurs. Accordingly, there is increased raw material consumption and cost. In slurry-phase Direct Reactions, elutriation does not occur. Exploitation of this advantage has led to the use of nanosized copper and copper compounds with average particle sizes 0.1 -600 nanometers (an average of 100 times smaller than the conventional) in the Direct Synthesis of methylchlorosilanes and trialkoxysilanes. Nanosized promoters have also been used advantageously in the Direct Synthesis of methylchlorosilanes. Data will be presented to show that nanosized materials afford high dispersion of catalytic sites on silicon and contribute to high reaction rates, high selectivity and high silicon conversion in the Direct Synthesis of methylchlorosilanes, trimethoxysilane and triethoxysilane.
机译：硅的常规流化床直接反应通常在45-500微米的硅和1-5微米的铜和促进剂源下进行。粒度的这种差异导致硅和催化剂/助催化剂从反应器中逸出的速度明显不同。发生较细颗粒的优先淘析。因此，增加了原材料消耗和成本。在淤浆相直接反应中，不会发生淘析。利用该优势导致在甲基氯硅烷和三烷氧基硅烷的直接合成中使用平均粒径为0.1 -600纳米（平均比常规粒径小100倍）的纳米级铜和铜化合物。纳米尺寸的促进剂也已经有利地用于甲基氯硅烷的直接合成中。将提供数据以表明，纳米级材料在甲基氯硅烷，三甲氧基硅烷和三乙氧基硅烷的直接合成中提供了在硅上的催化位点的高度分散并有助于高反应速率，高选择性和高硅转化率。

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