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Analysis of insulator surface charging due to charge injection and secondary electron emission in vacuum

机译：真空中电荷注入和二次电子发射引起的绝缘子表面带电分析

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摘要

During the developing process of flashover across an insulator in vacuum, the insulator surface is usually charged. It is of great importance to analyze the charging phenomena for better understanding the flashover characteristics in vacuum. It is considered that there are two kinds of mechanisms closely related to the surface charging phenomena of insulating materials, i.e., the classical secondary electron emission occurring over an insulator, and charge injection and accumulation occurring inside an insulator. Based on the rigorous analysis of the kinetic processes of both primary and secondary electrons, the related surface charges were analyzed. In this process, the influence of image force of mirror charge was taken into account. Involving the detrapping of charges trapped and the recombination of charges injected, the charging process due to charge injection and accumulation was also deduced theoretically. Some formulas were given to express the density of surface charges.
机译：在真空中跨越绝缘子闪络的显影过程中，绝缘子表面通常带电。为了更好地了解真空中的闪络特性，分析充电现象非常重要。认为存在两种与绝缘材料的表面带电现象密切相关的机理，即发生在绝缘体上的经典的二次电子发射和发生在绝缘体内部的电荷注入和累积。在对一次电子和二次电子的动力学过程进行严格分析的基础上，分析了相关的表面电荷。在该过程中，考虑了镜面电荷的像力的影响。从理论上推导了涉及被俘获电荷的去俘获和注入的电荷的重新结合的过程。给出了一些公式来表示表面电荷的密度。

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