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首页> 外文会议>Current developments in lens design and optical engineering XI; and advances in thin film coatings VI >Bound-Abrasive Grinding and Polishing of Surfaces of Optical Materials
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Bound-Abrasive Grinding and Polishing of Surfaces of Optical Materials

机译：光学材料表面的打磨研磨和抛光

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Problems of improving efficiency and quality of diamond-abrasive finishing of optical materials by tools with bounded polishing powders, including diamond powder, by means of the improvement of the machining technology and application of new tools with functionally oriented designs and characteristics of working layer are considered. A model has been proposed of the slime particle formation and directional removal as well as of the generation of a high-quality surface in diamond-abrasive finishing of optical materials taking into account the peculiarities of the mass transfer in the contact zone and statistic character of the distribution of slime particles by size. The dependences of the particle number on the diffusion angle and coordinate of the contact have been derived in the studies of the dynamics of collision and diffusion of slime particles. The coordinate dependence of the flat surface roughness of glass K8 optics in fine diamond grinding has been described. Interaction and dispersion of deterioration particles in a contact zone of the tool and a processed sample in the course of polishing is described and the dispersion structure of deterioration particles of the tool on slime particles and on deterioration particles is explained oscillatory. It is shown, that differential dispersion section of deterioration particles on slime particles no less than on deterioration particles as much as possible at corners of dispersion close to 0 and 180o on the central sites of a contact zone. Coordinate dependence of full dispersion section of deterioration particles of the tool and dependence of microprofile height of the processed surface on circular zones radius are calculated. Conformity of experimental and theoretical microroughness profiles of a polished surface on a quartz sample is shown.
机译：考虑了通过改进加工技术和应用具有功能导向设计和工作层特性的新工具，通过使用包括金刚石粉在内的有限抛光粉的工具来提高光学材料的金刚石磨料抛光效率和质量的问题。 。考虑到在接触区域传质的特殊性和材料的统计特性，已经提出了一种模型，用于在光学材料的金刚石磨料抛光中形成粘液颗粒，定向去除以及生成高质量表面。煤泥颗粒的大小分布。在对粘液颗粒的碰撞和扩散动力学的研究中，已经得出了颗粒数目对接触扩散角和接触坐标的依赖性。已经描述了在精细金刚石研磨中玻璃K8光学器件的平面粗糙度的坐标依赖性。描述了在研磨过程中劣化颗粒在工具和处理后的样品的接触区域中的相互作用和分散，并且振荡地解释了工具的劣化颗粒在粘液颗粒和劣化颗粒上的分散结构。结果表明，在接触区域的中心部位，在接近0°和180°的分散角处，在粘液颗粒上的劣化颗粒的不均匀分散部分不小于在劣化颗粒上。计算工具的劣化颗粒的全分散截面的坐标依赖性和加工表面的微轮廓高度对圆形区域半径的依赖性。显示了石英样品上抛光表面的实验和理论微粗糙度轮廓的一致性。

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