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Aberration theory and a design method of double-element optical systems

机译:双元件光学系统的像差理论和设计方法

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Abstract: To establish the theoretical basis for providing a better design method of synchrotron radiation beamline optics, we have developed a third-order aberration theory of a double- grating system and derived analytic formulas for spot diagrams and aberration curves. We describe an analytic merit function and a new definition of the resolving power. The former closely represents the variance of a very large number of ray-traced spots in the image plane and takes into account the dimensions of a source and optical elements. The latter takes into account the effects of an asymmetric line profile and a finite exit-slit width. The equations of aberration curves, merit function, and the definition of the resolving power are evaluated by taking three designs of a Monk-Gillieson varied-spacing plane grating monochromator as testing optics. The analytic merit function is used for these designs. The result show that the features of ray- traced spot diagrams can be analyzed by means of aberration curves and that realistic resolving power can be predicted by the new definition. The results also show the relation between the formation of coma-free images and the choice of design wavelengths. All these findings support the effectiveness of the analytic merit function in the design work. !15
机译:摘要:为建立更好的同步辐射束线光学器件设计方法的理论基础,我们开发了双光栅系统的三阶像差理论,并推导了点图和像差曲线的解析公式。我们描述了一个解析功函数和一个新的解析能力定义。前者紧密地代表了图像平面中大量光线追踪光斑的变化,并考虑了光源和光学元件的尺寸。后者考虑了不对称线轮廓和有限的出口缝宽度的影响。通过采用Monk-Gillieson变间距平面光栅单色仪的三种设计作为测试光学器件,评估像差曲线方程,优值函数和分辨力的定义。这些设计使用了分析价值函数。结果表明,可以通过像差曲线分析光线跟踪点图的特征,并且可以通过新定义来预测现实的分辨能力。结果还显示了无昏迷图像的形成与设计波长的选择之间的关系。所有这些发现都证明了设计功绩分析功能的有效性。 !15

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