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Development of a laser holographic interference lithography system

机译:激光全息干涉光刻系统的开发

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Abstract: Fabrication of periodic grating is very important for photonic devices such as Distributed Feedback (DFB) lasers, optical fiber Bragg grating based devices and optical couplers. Here, we report the development of holographic grating techniques utilizing a rotary mirror holder for grating period from 10 $mu@m to 0.5 $mu@m and Fresnel bimirrors for period greater than 1 $mu@m. These holographic technique offers a wide range of tunability, good resolution, relatively simple apparatus, high uniformity and large-coverage of pattern area. A single line HeCd laser was used in these set ups. The grating patterns have been successfully transferred onto GaAs substrate after dry etching with photoresist as mask. In addition, with the insertion of orthogonal Fresnel bimirror in the systems, square grating patterns have been successfully obtained with grating period of 2 $mu@m $MUL 2 $mu@m. !5
机译:摘要:对于诸如分布式反馈(DFB)激光器,基于光纤布拉格光栅的器件和光耦合器之类的光子器件,周期性光栅的制造非常重要。在这里,我们报道了全息光栅技术的发展,该技术利用旋转镜架对光栅周期从10μm至0.5μm的光和菲涅耳双镜对周期大于1μm的光进行了开发。这些全息技术提供了广泛的可调性,良好的分辨率,相对简单的设备,高均匀性和图案区域的大覆盖率。在这些设置中使用了单行HeCd激光器。在以光刻胶为掩模的干法刻蚀之后,光栅图形已成功地转移到GaAs衬底上。另外,通过在系统中插入正交菲涅耳双镜,已经成功地获得了正方形光栅图案,其光栅周期为2μm·m·MUL·2μm·m。 !5

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