Pattern matching for double patterning technology-compliant physical design flows

机译：模式匹配可实现符合双图案技术的物理设计流程

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A pattern-based methodology for guiding the generation of DPT-compliant layouts using a foundry-characterized libraryof "difficult to decompose" patterns with known corresponding solutions is presented. A pattern matching engine scansthe drawn layout for

机译：提出了一种基于模式的方法，该方法用于使用铸造厂特征化的“难于分解”模式的库和已知的相应解决方案来指导DPT兼容布局的生成。模式匹配引擎会扫描绘制的布局以查找

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来源
《Design for manufacturability through design-process integration VI.》|2012年|P.08.1-08.9|共9页
会议地点 San Jose CA(US)
作者
Lynn T. Wang; Vito Dai; Luigi Capodieci;
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作者单位

GLOBALFOUNDRIES Inc. (United States);

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会议组织
原文格式 PDF
正文语种 eng
中图分类微电子学、集成电路（IC）;微电子学、集成电路（IC）;
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4. A scoring methodology for quantitatively evaluating the quality of double patterning technology-compliant layouts [C] . Lynn T. Wang, Sriram Madhavan, Shobhit Malik, Design for manufacturability through design-process integration VI. . 2012

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Pattern matching for double patterning technology-compliant physical design flows

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