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Call for an Industry Standard for Pattern Transfer Models for Usage in OPC and Design for Manufacturability

机译：呼吁为OPC中使用的图案转移模型和可制造性设计制定行业标准

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Lately, "Design for Manufacturability" (DFM) can be found in almost any self-respecting EDA vendor's top-five list of most critical and urgent strategic topics. While the envisioned DFM activities cover a broad spectrum of topics, the exact definition of DFM continues to evade capture. However, it appears self-evident that an important portion of DFM hinges upon the availability of models accurately describing the pattern transfer from the layout to the wafer, here called "pattern transfer models" (PTMs). In combination with a suitable design environment, PTMs will allow physical designers to optimize their layout, thus ensuring the structural integrity over the process window upon transfer to the wafer. In this paper, we argue that PTMs have an importance comparable to that of the "electrical device models" (EDMs) widely used for circuit simulation. We point out some striking analogies between PTMs and EDMs, as far as the basic concepts and use models are concerned. Furthermore, we highlight the significant differences in the EDA landscapes for both model types, most importantly the fact that an industry standard only exists for EDMs. Based on the consequences for EDA vendors and users, as well as manufacturing cooperations that derive from this situation, we formulate the call for an industry standard for PTMs for usage in "Optical Proximity Correction" (OPC) and DFM.
机译：最近，几乎在任何具有自尊心的EDA供应商的最关键和紧迫的战略主题的前五名中都可以找到“可制造性设计”（DFM）。尽管设想的DFM活动涵盖了广泛的主题，但DFM的确切定义仍在逃避捕获。然而，不言而喻的是，DFM的重要部分取决于模型的可用性，该模型准确地描述了从布局到晶圆的图案转移，这里称为“图案转移模型”（PTM）。结合合适的设计环境，PTM将允许物理设计人员优化其布局，从而在转移到晶圆时确保工艺窗口上的结构完整性。在本文中，我们认为PTM的重要性可与广泛用于电路仿真的“电子设备模型”（EDM）媲美。在基本概念和使用模型方面，我们指出了PTM和EDM之间的一些惊人相似之处。此外，我们强调了两种模型类型在EDA环境中的显着差异，最重要的是，仅针对EDM存在行业标准。基于对EDA供应商和用户的后果，以及从这种情况引起的制造合作，我们制定了关于在“光学邻近校正”（OPC）和DFM中使用的PTM行业标准的呼吁。

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