首页> 外国专利> OPC (OPTICAL PROXIMITY CORRECTION) MODEL CREATING METHOD, OPC MODEL CREATING PROGRAM, OPC MODEL CREATING DEVICE, EXPOSURE DEVICE ADJUSTING METHOD, EXPOSURE DEVICE ADJUSTING PROGRAM, EXPOSURE DEVICE ADJUSTING DEVICE, SEMICONDUCTOR DEVICE MANUFACTURING METHOD, SEMICONDUCTOR DEVICE MANUFACTURING PROGRAM, AND SEMICONDUCTOR DEVICE MANUFACTURING APPARATUS

OPC (OPTICAL PROXIMITY CORRECTION) MODEL CREATING METHOD, OPC MODEL CREATING PROGRAM, OPC MODEL CREATING DEVICE, EXPOSURE DEVICE ADJUSTING METHOD, EXPOSURE DEVICE ADJUSTING PROGRAM, EXPOSURE DEVICE ADJUSTING DEVICE, SEMICONDUCTOR DEVICE MANUFACTURING METHOD, SEMICONDUCTOR DEVICE MANUFACTURING PROGRAM, AND SEMICONDUCTOR DEVICE MANUFACTURING APPARATUS

机译：OPC（光学邻近修正）模型创建方法，OPC模型创建程序，OPC模型创建设备，曝光设备调整方法，曝光设备调整程序，曝光设备调整设备，半导体制造商，制造商，制造商，制造商，制造商，制造商，制造商，制造商，制造商，制造商

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PROBLEM TO BE SOLVED: To provide a method of creating an OPC model for converging OPC models and exposure conditions as early as possible.;SOLUTION: In the method, design layout 22C is corrected by using leveling offset 22D as defocusing value of input parameter 22G to create the OPC model. A stage 13 is adjusted so that deviation of positions of the best focus forming face and a reference face S1 becomes the minimum value. Whether deviation quantity D exceeds a threshold 22H is determined after acquireing a position 22E of a surface S1 of wafer and the deviation quantity D. The design layout 22C is corrected by using the deviation quantity D as the defocusing value of the input parameter 22G at a measuring point where the deviation quantity D exceeds the threshold 22H to create the OPC model again. If a transferred image does not reach the threshold 22J after inspecting the OPC, process parameters in the region are corrected to create the OPC model again.;COPYRIGHT: (C)2009,JPO&INPIT

机译：解决的问题：提供一种创建OPC模型的方法，以尽可能早地收敛OPC模型和曝光条件。解决方案：在该方法中，通过使用水平偏移量22D作为输入参数22G的散焦值来校正设计布局22C。创建OPC模型。调节台架13，使得最佳焦点形成面和基准面S1的位置偏差变为最小值。在获取晶片表面S1的位置22E和偏差量D之后，确定偏差量D是否超过阈值22H。通过在a处将偏差量D用作输入参数22G的散焦值来校正设计布局22C。偏差量D超过阈值22H的测量点再次创建OPC模型。如果在检查OPC之后传输的图像未达到阈值22J，则对该区域中的过程参数进行校正以再次创建OPC模型。;版权：（C）2009，JPO＆INPIT

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公开/公告号JP2009115844A

专利类型
公开/公告日2009-05-28

原文格式PDF
申请/专利权人 SONY CORP;
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申请/专利号JP20070285262
发明设计人 DEWA KYOKO;KOIKE KAORU;OGAWA KAZUHISA;
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申请日2007-11-01
分类号G03F1/08;H01L21/027;G03F7/20;
国家 JP
入库时间 2022-08-21 19:42:43

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