Techniques for determination of the absorbed energy density function in electron-beam lithography

机译：电子束光刻中吸收能量密度函数的确定技术

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Abstract: An experimental technique for measurement of the absorbed energy density distribution from the center of an electron beam is presented. The test structure and the way of determining critical exposure doses are constructed in such a way that the resist development process has no influence on the experimental results. Questions of `technological' and `physical' proximity functions usage are considered. The absorbed energy density function measurements were carried out for a number of accelerating voltages. The dependence of these function parameters on the electron's energy was determined. !7

机译：摘要：提出了一种从电子束中心测量吸收能密度分布的实验技术。测试结构和确定关键曝光剂量的方式应使抗蚀剂显影过程对实验结果没有影响。考虑“技术”和“物理”邻近功能用法的问题。吸收能量密度函数的测量是针对许多加速电压进行的。确定了这些功能参数对电子能量的依赖性。！7

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《Electron-Beam, X-Ray, and Ion-Beam Submicrometer Lithographies for Manufacturing IV》|1994年|p.281-286|共6页
会议地点 San Jose CA(US)
作者
Sergei V. Babin; Physics; Technology Institute; Moscow; Russia.;
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正文语种 eng
中图分类无线电电子学、电信技术;
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Techniques for determination of the absorbed energy density function in electron-beam lithography

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