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首页> 外文会议>Electron-Beam, X-Ray, and Ion-Beam Submicrometer Lithographies for Manufacturing IV >application and experimental verification of finite element modeling of frictioneffects for x-ray lithography mask mounts
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application and experimental verification of finite element modeling of frictioneffects for x-ray lithography mask mounts

机译：射线光刻掩模版摩擦效果有限元建模的应用与实验验证

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Abstract: In general, the application of finite element modeling to x-ray lithography mask distortions has assumed ideal conditions, i.e., frictionless mounts. Under actual conditions, friction can play a part in inducing both out-of-plane (OPD) and in-plane distortions (IPD) of the x-ray mask due to mounting or environmental conditions. This paper discusses the application of nonlinear three-dimensional interface elements to simulate friction in existing finite element (FEM) models of various masks and verifies the accuracy of the modeling with interferometric studies of both OPD and IPD for different mask configurations. Once the finite element models have been verified, the friction elements are then applied to a FEM model of the ARPA-NIST Mask Standard (with a kinematic mount) to determine the effects of friction on the IPD as a function of environmental temperature and clamping force. The results of this analysis show both the importance of designing ideal mounts (i.e., frictionless) as well as maintaining a fixed environmental temperature and controlling the clamping forces during the writing and exposure of x-ray lithography masks. !10
机译：摘要：通常，将有限元建模应用于X射线光刻掩模变形已假定了理想条件，即无摩擦安装座。在实际条件下，由于安装或环境条件的影响，摩擦会导致X射线面罩的面外（OPD）和面内变形（IPD）产生影响。本文讨论了非线性三维界面元素在模拟现有各种面罩的有限元（FEM）模型中的摩擦中的应用，并通过对不同面罩配置的OPD和IPD进行干涉测量研究，验证了建模的准确性。一旦验证了有限元模型，然后将摩擦元件应用于ARPA-NIST面罩标准件的FEM模型（带有运动学安装座），以确定摩擦对IPD的影响与环境温度和夹紧力的关系。该分析的结果表明，设计理想的安装座（即，无摩擦）以及在X射线光刻掩模的写入和曝光期间保持固定的环境温度并控制夹持力的重要性。 ！10

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