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Recent progress in gas field ion source technology

机译：气田离子源技术的最新进展

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Abstract: The advent of nanostructurization technology has also strongly pushed the development of finely focused ion beams of high intensity. While the liquid-metal ion source, LMIS, has already marked a major breakthrough with regard to the available target current densities during the last decade, the gas field ion source, GFIS, has more recently presented an even more promising solution to the problem of ion-beam processing of macroscopic target areas in reasonable time scales. In particular, this progress has been achieved by controlled generation of a small protrusion, called supertip, on top of a regular field emitter tip. In this way, ion current densities of up to 100 A/cm$+2$/ appear feasible for certain gases, such as hydrogen, helium, and neon with spot diameters down to 10 nm. Compared to the LMIS, this means an increase in target current density of more than one order of magnitude. The relevant parameters of our supertip GFIS system, characterizing source and ion optics, are given and some first ionographic applications in the fields of optical patterning and topographical structurization, demonstrating the state of the art, are discussed. !15
机译：【摘要】纳米结构技术的出现也强烈推动了高强度精细聚焦离子束的发展。在过去的十年中，液态金属离子源LMIS在可用的目标电流密度方面已经取得了重大突破，而气田离子源GFIS最近为解决该问题提供了更有希望的解决方案。在合理的时间范围内对宏观目标区域进行离子束处理。特别地，已经通过在规则的场发射器尖端的顶部上受控地产生称为超尖端的小突起来实现了这一进展。这样，对于某些直径小于10 nm的气体，例如氢气，氦气和氖气，高达100 A / cm $ + 2 $ /的离子电流密度似乎是可行的。与LMIS相比，这意味着目标电流密度增加了一个数量级以上。给出了我们的超尖端GFIS系统的相关参数，表征了离子源和离子光学，并讨论了在光学图形化和地形结构化领域的一些首次电离应用，展示了现有技术。 ！15

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