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首页> 外文会议>Electron-Beam, X-Ray, and Ion-Beam Submicrometer Lithographies for Manufacturing II >Advanced e-beam systems for manufacturing
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Advanced e-beam systems for manufacturing

机译：先进的电子束制造系统

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Abstract: E-beam lithography systems are being employed as pattern generators in the semiconductor manufacturing process. The TV- like raster exposure of a scanning electron beam under computer control provides the resolution, flexibility, and accuracy needed for the generation of high density integrated circuit patterns. E-beam mask making has become the technology of choice, while e- beam direct writing on the wafer has remained largely a niche application. Here the throughput handicap of serial exposure presented an economic hurdle, which limited applications to exploratory research and prototyping rather than manufacturing - with few exceptions: IBM, for example, has applied its internally developed high-throughput EL-series systems worldwide in large scale manufacturing of ASIC-type bipolar logic products. The recent progress in state-of-the-art of manufacturing-oriented e- beam systems for mask making and direct writing, together with results achieved with these advanced systems, is the subject of this paper.!35
机译：摘要：电子束光刻系统被用作半导体制造过程中的图案发生器。在计算机控制下，扫描电子束的电视状光栅曝光提供了生成高密度集成电路图案所需的分辨率，灵活性和准确性。电子束掩模制造已成为首选技术，而在晶片上直接进行电子束直接书写仍然是一种利基应用。在这里，串行曝光的生产量障碍带来了一个经济障碍，这将应用程序限制在探索性研究和原型设计而不是制造上，除了少数例外：例如，IBM在全球范围内将其内部开发的高通量EL系列系统应用于大规模制造ASIC型双极性逻辑产品。本文旨在探讨掩模制造和直接写入的面向制造的电子束系统的最新技术进展，以及使用这些先进系统所取得的成果。35

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