Method and system of monitoring E-beam overlay and providing advanced process control

• 1. 监测电子束覆盖并提供先进过程控制的方法和系统 [P] . 中国专利： CN101923289B . 2012.05.23
• 2. 监测电子束覆盖并提供先进过程控制的方法和系统 [P] . 中国专利： CN101923289A . 2010-12-22
• 3. METHOD AND SYSTEM OF MONITORING E-BEAM OVERLAY AND PROVIDING ADVANCED PROCESS CONTROL [P] . 美国专利： US2010294955A1 . 2010-11-25

  机译： 监测电子束覆盖并提供高级过程控制的方法和系统

• 4. METHODS AND SYSTEMS FOR MONITORING PLASMA PROCESSING SYSTEMS AND ADVANCED PROCESS AND TOOL CONTROL [P] . 韩国专利： KR20180015582A . 2018-02-13

  机译： 用于监测等离子体处理系统以及高级过程和工具控制的方法和系统

• 5. Methods and Systems for Monitoring Plasma Processing Systems and Advanced Process and Tool Control [P] . 美国专利： US2018040460A1 . 2018-02-08

  机译： 监测等离子处理系统以及高级过程和工具控制的方法和系统

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