CONTROLLING THE DEPOSITION OF MICROCRYSTALLINE SILICON THIN FILMS BY MAGNETIC FIELD

机译：磁场控制微晶硅薄膜的沉积

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Permanent magnet below the substrate influenced growth of thin silicon film during the plasma enhanced chemical vapor deposition. If the magnet is oriented parallel to the substrate, fully microcrystalline layer can be obtained above its position. Detail microscopic study by micro-Raman spectroscopy and atomic force microscopy is presented. We will discuss the internal stress in the layer measured by X-ray diffraction and micro Raman spectroscopy. Formation of microcrystalline regions in otherwise amorphous layer is easily reproducible and could be used for, magnetic lithography". Special attention will be given to possible applications in photovoltaics.

机译：在等离子体增强化学气相沉积过程中，基板下方的永磁体影响了薄膜的生长。如果磁体平行于衬底定向，则在其位置上方可以获得完全微晶的层。提出了通过拉曼光谱和原子力显微镜进行的详细显微研究。我们将讨论通过X射线衍射和显微拉曼光谱测量的层中的内部应力。在原本无定形的层中形成微晶区很容易重现，可用于磁性光刻。”将特别注意光伏中的可能应用。

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来源
《European Photovoltaic Solar Energy Conference; 20060904-08; Dresden(DE)》|2006年|P.1753-1756|共4页
会议地点 Dresden(DE)
作者
M. Ledinsky; A.Vetushka; J. Stuchlik; T. Mates; A. Fejfar; J. Kocka;
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作者单位

Institute of Physics, Academy of Sciences of the Czech Republic Cukrovarnicka 10, 162 53 Prague;

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会议组织
原文格式 PDF
正文语种 eng
中图分类太阳能技术;
关键词
magnetized plasma; thin films; amorphous silicon; microcrystalline silicon;

机译：磁化等离子体;薄膜;非晶硅;微晶硅;

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1. 氢稀释比对磁控溅射低温(100℃)沉积氢化微晶硅薄膜微结构特性的影响 [J] . 王林青, 周永涛, 王军军, 中南大学学报（英文版） . 2019,第010期
2. Plasma-Enhanced Reactive Magnetron Sputtering Assisted with Inductively Coupled Plasma for Reactivity-Controlled Deposition of Microcrystalline Silicon Thin Films [J] . Kosuke Takenaka, Yuichi Setsuhara, Akinori Ebe Japanese journal of applied physics . 2013,第11Issue2期

机译：电感耦合等离子体辅助的等离子体增强反应磁控溅射技术，用于微晶硅薄膜的反应性控制沉积
3. Low-temperature Deposition of Hydrogenated Microcrystalline Silicon Thin Films by Photochemical Vapor Deposition Technique and Their Application to Thin Film Solar Cells [J] . Shuichi HIZA, Akira YAMADA, Makoto KONAGAI Japanese Journal of Applied Physics. Part 1, Regular Papers, Brief Communications & Review Papers . 2007,第4A期

机译：光化学气相沉积技术低温沉积氢化微晶硅薄膜及其在薄膜太阳能电池中的应用
4. Optical emission spectroscopy as a process control tool during plasma enhanced chemical vapor deposition of microcrystalline silicon thin films [J] . C.C. Du, T.C. Wei, C.H. Chang, Thin Solid Films . 2012,第11期

机译：在微晶硅薄膜的等离子体增强化学气相沉积过程中，将光发射光谱作为过程控制工具
5. CONTROLLING THE DEPOSITION OF MICROCRYSTALLINE SILICON THIN FILMS BY MAGNETIC FIELD [C] . M. Ledinsky, A.Vetushka, J. Stuchlik, European Photovoltaic Solar Energy Conference . 2006

机译：通过磁场控制微晶硅薄膜的沉积
6. Deposition and characterization of hydrogenated amorphous silicon, microcrystalline silicon and silicon-based alloy thin films. [D] . Wang, Cheng. 1991

机译：氢化非晶硅，微晶硅和硅基合金薄膜的沉积和表征。
7. Effect of Sample Elevation in Radio Frequency Plasma Enhanced Chemical Vapor Deposition (RF PECVD) Reactor on Optical Properties and Deposition Rate of Silicon Nitride Thin Films [O] . Mateusz Œmietana, Robert Mroczyński, Norbert Kwietniewski 2014

机译：射频等离子体增强化学气相沉积（RF PECVD）反应器中样品高度对氮化硅薄膜光学性能和沉积速率的影响
8. Influence of Deposition Temperature on Microcrystalline Silicon Thin Film Prepared by Plasma Enhanced Chemical Vapor Deposition [O] . 2016

机译：沉积温度对等离子体增强化学气相沉积制备微晶硅薄膜的影响
9. Exploratory Development of Thin-Film Polycrystalline Silicon Photovoltaic Devices. Molybdenum TESS Process for Continued Shear Separation of Microcrystalline Silicon Films. Topical Report No. 2 [R] . Sarma, K. R., Rice, M. J. 1981

机译：薄膜多晶硅光伏器件的探索性发展。用于连续剪切分离微晶硅薄膜的钼TEss工艺。第2号专题报告

CONTROLLING THE DEPOSITION OF MICROCRYSTALLINE SILICON THIN FILMS BY MAGNETIC FIELD

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