Applied Ceramics Research, Colorado Springs, Colorado, 80919;
机译:射频磁控溅射在Pt电极上低温沉积Ba_(0.96)Ca_(0.04)Ti_(0.84)Zr_(0.16)O_(3)薄膜
机译:退火对带Pt电极的Ba_(0.5)Sr_(0.5)TiO_3和Ba_(0.96)Ca_(0.04)Ti_(0.84)Zr_(0.16)O_3薄膜泄漏电流的影响
机译:金属有机分解法在Pt / MgO上掺杂Mg的Ba_(0.96)Ca_(0.04)Ti_(0.84)Zr_(0.16)O_3薄膜的介电性能和可调性
机译:通过RF磁控溅射,低温沉积Ba_(0.96)Ca_(0.04)Ti_(0.04)Ti_(0.04)Zr_(0.84)Zr_(0.16)O_3薄膜PT电极上的薄膜
机译:射频反应磁控溅射在低温下沉积在硅上的压电氮化铝薄膜的声波器件特性
机译:氧浓度对超薄射频磁控溅射沉积铟锡氧化物薄膜作为光伏器件上电极的性能的影响
机译:外延Ti_ {0.96} Co_ {0.04} O_2薄的Co纳米团簇的形成 电影及其铁磁性