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首页> 外文会议>Ferroelectric Thin Films XII >Effect of Deposition Parameters on the Microstructural Evolution and Electrical Properties of Charge-Balanced Barium Strontium Titanate Ferroelectric Thin Films Deposited on Ceramic Substrates by Pulsed Laser Deposition
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Effect of Deposition Parameters on the Microstructural Evolution and Electrical Properties of Charge-Balanced Barium Strontium Titanate Ferroelectric Thin Films Deposited on Ceramic Substrates by Pulsed Laser Deposition

机译：沉积参数对脉冲激光沉积沉积在陶瓷基体上的电荷平衡钛酸锶锶钡铁电薄膜的微观结构演变和电性能的影响

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摘要

Barium strontium titanate (Ba_(0.60)Sr_(0.40)TiO_3) thin films are the main materials of interest in tunable phase shifter for microwave antenna applications. Ba_(0.60)Sr_(0.40)Y_(0.05)Ta_(0.90)Ti_(0.90)O_3 thin films, of nominal thickness ranging from 1.7 μm to 2.3 μm, were synthesized on MgO (100) substrates, at substrate temperatures ranging from 500℃ to 900℃, at oxygen partial pressures 20 and 50 mTorr, at 500 mJ energy fluence on 3 mm x 1 mm spot size and 10 pulses per second using the pulsed laser deposition technique. All film synthesized at temperatures greater than 500℃ were crystalline. The effect of the ionic substitution and substrate temperature in conjunction with the effect of the oxygen partial pressure on the microstructure, and mechanical and electrical properties of the thin films have been studied using shallow angle x-ray diffraction, SEM, nanoindentation, atomic force microscopy (AFM), and focused ion beam analysis (FIB) and are reported in detail. We are currently in the process of measuring the capacitance of these films by various methods.
机译：钛酸锶钡（Ba_（0.60）Sr_（0.40）TiO_3）薄膜是微波天线应用可调谐移相器中关注的主要材料。在MgO（100）衬底上以500的衬底温度合成了标称厚度为1.7μm至2.3μm的Ba_（0.60）Sr_（0.40）Y_（0.05）Ta_（0.90）Ti_（0.90）O_3薄膜使用脉冲激光沉积技术，在氧气分压为20和50 mTorr，氧气通量为500 mJ，3 mm x 1 mm斑点大小和每秒10个脉冲的情况下，可从℃升高至900℃。在高于500℃的温度下合成的所有膜都是结晶的。使用浅角X射线衍射，SEM，纳米压痕，原子力显微镜研究了离子取代和底物温度以及氧分压对薄膜微观结构以及机械和电学性质的影响。 （AFM）和聚焦离子束分析（FIB），并进行了详细报道。我们目前正在通过各种方法来测量这些薄膜的电容。

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