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Enhancement of laser machining resolution using the two photon absorption effect

机译:利用两个光子吸收效应提高激光加工分辨率

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摘要

One of the main strengths of ultrafast laser machining is its ability to produce very high resolution cuts. This is useful in a range of fields for manufacturing purposes, however being able to incorporate two photon absorption (TPA) to further enhance this would allow even smaller fabrication. In this study we look at the effect of doping amorphous polycarbonate with two different molecules (R1 and R2) which have been identified to have a high TPA cross-section. Using the diameter regression (D~2) technique, we observe a notable decrease in the ablation thresholds as dopant concentration increases from 0 - 10%. In addition, these results provide a measurement of effective beam waist (ω_(eff)). Beam waist values for R2 doped samples show a decrease to half the reference, which can be linked to an increase in the occurrence of multiphoton absorption. Linear ablation features produced at identical peak powers and pulse numbers show improved machining resolution as dopant concentration increases. This increase in resolution is more prolific for R2 than R1 despite their similar TPA cross sections. We believe that this is due to the relative bandgaps of the materials causing three photon absorption for R2 whereas multiphoton absorption is limited to the second order process for R1. This means by doping appropriate materials with these molecules it is possible to improve resolution whilst maintaining most properties of the main material.
机译:超快速激光加工的主要优势之一是它能够产生非常高的分辨率。这在用于制造目的的一系列领域中是有用的,但是能够结合两个光子吸收(TPA)来进一步增强这一点将允许甚至更小的制造。在这项研究中,我们研究了用两种不同的分子(R1和R2)掺杂无定形聚碳酸酯的效果,这些分子已被确定具有较高的TPA横截面。使用直径回归(D〜2)技术,我们观察到随着掺杂剂浓度从0-10%增加,烧蚀阈值显着降低。另外,这些结果提供了有效束腰的测量值(ω_(eff))。掺杂R2的样品的束腰值显示降低到参考值的一半,这可能与多光子吸收发生的增加有关。在相同的峰值功率和脉冲数下产生的线性烧蚀特征显示出随着掺杂剂浓度增加而提高的加工分辨率。尽管R2的TPA横截面相似,但与R1相比,R2的分辨率提高幅度更大。我们认为,这是由于材料的相对带隙导致R2吸收了三个光子,而多光子吸收仅限于R1的二阶过程。这意味着通过用这些分子掺杂适当的材料,可以在保持主要材料的大多数性能的同时提高分离度。

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  • 来源
  • 会议地点 San Francisco(US)
  • 作者单位

    The Photon Factory, The University of Auckland, Auckland, New Zealand,The MacDiarmid Institute for Advanced Materials and Nanotechonology and The Dodd Walls Centre for Quantum and Photonic Technologies, New Zealand,School of Chemical Sciences, The University of Auckland, Auckland, New Zealand;

    The Photon Factory, The University of Auckland, Auckland, New Zealand,The MacDiarmid Institute for Advanced Materials and Nanotechonology and The Dodd Walls Centre for Quantum and Photonic Technologies, New Zealand,School of Chemical Sciences, The University of Auckland, Auckland, New Zealand;

    The Photon Factory, The University of Auckland, Auckland, New Zealand,The MacDiarmid Institute for Advanced Materials and Nanotechonology and The Dodd Walls Centre for Quantum and Photonic Technologies, New Zealand,School of Chemical Sciences, The University of Auckland, Auckland, New Zealand;

    Callaghan Innovation, Lower Hutt, New Zealand;

    The Photon Factory, The University of Auckland, Auckland, New Zealand,The MacDiarmid Institute for Advanced Materials and Nanotechonology and The Dodd Walls Centre for Quantum and Photonic Technologies, New Zealand,School of Chemical Sciences, The University of Auckland, Auckland, New Zealand,Department of Physics, The University of Auckland, Auckland, New Zealand;

  • 会议组织
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    ultrafast ablation; resolution; two-photon absorption; R1; R2;

    机译:超快速消融;解析度;双光子吸收R1; R2;

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