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Gd-implanted GaN as a candidate for spin injector

机译:植入GaN的GaN作为自旋注入器的候选材料

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Due to their unique physical properties GaN-based heterostructures show a great promise for spintronics applications. This stimulates the search for GaN-based ferromagnetic semiconductors which can be used for injection of spin polarized carriers in device structures. In this study, magnetic properties of GaN layers implanted with Gd~+ ions to various doses were investigated. Magnetization curves of samples with Gd content n_(Gd) = 2 x 10~(17) and 2 x 10~(18) cm~(-3) show clear hysteresis, while the samples with n_(Gd) = 2 x 10~(16) and 2 x 10~(19) cm~(-3) exhibit no ferromagnetism. Most likely, the lowest Gd concentration produced magnetization below the detection limit, whereas the absence of ferromagnetism in the sample with the highest Gd content may be resulted from heavy implantation-induced damage. Curie temperatures for samples with Gd contents of 2 x l0~(17) and 2 x 10~(18) cm~(-3) were estimated to be larger than 300 K. Saturation magnetizations of 1550 μ_B and 1350 μ_B per Gd-atom were found at 5 K and 300 K, respectively, for the sample with n_(Gd) = 2 x 10~(18) cm~(-3).
机译:由于其独特的物理性能,基于GaN的异质结构显示了自旋电子学应用的广阔前景。这刺激了对可用于注入器件结构中自旋极化载流子注入的GaN基铁磁半导体的搜索。在这项研究中,研究了以不同剂量注入了Gd〜+离子的GaN层的磁性。 Gd含量n_(Gd)= 2 x 10〜(17)和2 x 10〜(18)cm〜(-3)的样品的磁化曲线显示出清晰的磁滞,而n_(Gd)= 2 x 10〜 (16)和2 x 10〜(19)cm〜(-3)没有铁磁性。最有可能的是,最低的Gd浓度会产生低于检测极限的磁化强度,而具有最高的Gd含量的样品中缺乏铁磁性可能是由于严重的植入引起的损伤。 Gd含量为2 x 10〜(17)和2 x 10〜(18)cm〜(-3)的样品的居里温度估计大于300 K.每个Gd原子的饱和磁化强度为1550μB和1350μB对于n_(Gd)= 2 x 10〜(18)cm〜(-3)的样品,分别在5 K和300 K处发现了这些元素。

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