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Study of Micro-displacement Measuring System with Double F-P Interference Cavities

机译：双F-P干涉腔微位移测量系统的研究

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摘要

A kind of Micro-displacement measuring instrument using double interference cavities is designed. It is based on F-P interference wave length One of interference cavities is reference cavity, the other is measuring cavity.One reflect surface of reference cavity is installed with piezoelectric ceramics,One reflect surface of measuring cavity is erected with an object to be measured.When the central wavelengths in reference Fabry-Perot interference and in measuring Fabry-Perot interference are overlapped,there are the maximum light signal outputs. Based on the relationship between the transmission spectrum central wave length and its interference cavity length, this measuring instrument can be used to realize the real time measurement of Nano-grade micro-displacement.Using simi-conductor laser as the light resource can obtain the required wavelength values and its variation scopes.It can be seen from the measured results that the measured error is not over 1.5nm. Such a precision can satisfy the precision requirements as in the fields of precision mechanical processing, photoelectronic processing and Nano-grade measuring technology.
机译：设计了一种利用双干涉腔的微位移测量仪。它是基于FP干涉波长的，其中一个干涉腔是参考腔，另一个是测量腔。参考腔的一个反射面装有压电陶瓷，一个测量腔的反射面竖立有待测物体。参考法布里-珀罗干涉和测量法布里-珀罗干涉的中心波长是重叠的，有最大的光信号输出。根据传输光谱中心波长与其干涉腔长度之间的关系，该测量仪器可用于实现纳米级微位移的实时测量，采用半导体激光作为光源可获得所需波长值及其变化范围从测量结果可以看出，测量误差不超过1.5nm。这样的精度可以满足精密机械加工，光电加工和纳米级测量技术领域中的精度要求。

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