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首页> 外文会议>IEEE International Conference on Plasma Science >DC and Pulsed Boron Plasma and Ion Beam Generation by Planar Magnetron Discharge*
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DC and Pulsed Boron Plasma and Ion Beam Generation by Planar Magnetron Discharge*

机译：平面磁控管放电产生的直流和脉冲硼等离子体和离子束*

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. In the current work, boron plasma and ion beam were generated using DC and pulsed planar magnetron discharge with pure boron target. The discharge was realized using gradual self-heating of the target by the discharge power. With the target heated by the dc power up to the temperature of more than 300 °C which provides a sufficient electrical conductivity of the target, application of high current discharge pulses becomes possible. The delay time of high-current pulsed discharge current onset can be reduced in order of magnitude down to a few microseconds with background low-current DC discharge. Plasma ion composition was measured by forming the ion beam from the plasma with accelerating voltage up to 20 kV and its subsequent analysis with a time-of-flight methodic
机译：。在目前的工作中，使用直流和纯硼靶的脉冲平面磁控管放电产生硼等离子体和离子束。通过利用放电功率对靶进行逐渐自加热来实现放电。通过直流电源将靶加热到超过300°C的温度，从而提供足够的靶电导率，可以施加大电流放电脉冲。利用背景低电流直流放电，可以将大电流脉冲放电电流开始的延迟时间降低到几微秒。通过以高达20 kV的加速电压从等离子体形成离子束并随后采用飞行时间方法进行分析来测量等离子体的离子组成

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