TRANSMISSION ELECTRON MICROSCOPY ON METAL - AMORPHOUS CHALCOGENIDE FILMS

机译：金属-非晶硫化物薄膜的透射电子显微镜。

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TEM, SEM and AFM have been employed to study electron beam induced metal diffusion in metal - amorphous chalcogenide thin films. From electron diffraction patterns it was determined that silver and copper reacted spontaneously with the investigated chalcogenides. Upon irradiation with a focused electron beam the metal diffused away from the irradiated area, leaving metal-free tracks in the sample. The possibility of exploiting this effect for the development of a new generation of x-ray masks was evaluated.

机译：TEM，SEM和AFM已被用于研究电子束诱导的金属在金属-非晶硫族化物薄膜中的扩散。从电子衍射图可以确定，银和铜与所研究的硫族化物自发反应。在用聚焦电子束辐照后，金属扩散离开辐照区域，从而在样品中留下不含金属的痕迹。评估了利用这种效应开发新一代X射线掩模的可能性。

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来源
《Institute of Physics Electron Microscopy and Analysis Group Conference, Sep 5-7, 2001, Dundee》|2001年|p.477-480|共4页
会议地点 Dundee(GB);Dundee(GB)
作者
K Mietzsch; A G Fitzgerald;
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作者单位

University of Dundee, Department of Electronic Engineering and Physics, Dundee DD1 4HN;

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会议组织
原文格式 PDF
正文语种 eng
中图分类无线电电子学、电信技术;
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1. A transmission electron microscope study of metal/chalcogenide amorphous thin films [J] . Romero JS, Fitzgerald AG, Rose M Applied Surface Science . 2004,第1a4期

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3. A transmission electron microscopy and X-ray photoelectron spectroscopy study of annealing induced γ-phase nucleation, clustering, and interfacial dynamics in reactively sputtered amorphous alumina thin films [J] . A. K. Nanda Kumar, S. Prasanna, B. Subramanian, Journal of Applied Physics . 2015,第12期

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4. TRANSMISSION ELECTRON MICROSCOPY ON METAL - AMORPHOUS CHALCOGENIDE FILMS [C] . K Mietzsch, A G Fitzgerald, Institute of Physics, Institute of Physics Electron Microscopy and Analysis Group conference . 2001

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机译：适合用作相衬透射电子显微镜相板的非晶薄膜的污染和带电

TRANSMISSION ELECTRON MICROSCOPY ON METAL - AMORPHOUS CHALCOGENIDE FILMS

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