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Electron holography of biased semiconductor junctions

机译:偏置半导体结的电子全息图

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摘要

A two-contact TEM biasing holder has been designed and constructed for use in the Cambridge Philips CM300 FEGTEM. A silicon semiconductor device has been examined using off-axis electron holography under a reverse bias of 0 to 3V. Reconstructed differential phase images reveal changes in the electrostatic potential with varying reverse bias. Examination of a Si device without bias using off-axis electron holography has also been performed, indicating a phase change of 2.8 radians across the p-n junction. This corresponds to a built-in voltage of 0.85V, close to the expected value demonstrating the truly quantitative nature of electron holography.
机译:已经设计和构造了用于剑桥飞利浦CM300 FEGTEM的两触点TEM偏置支架。已经使用离轴电子全息图在0至3V的反向偏压下检查了硅半导体器件。重建的差分相位图像揭示了静电电位随反向偏压的变化。还已经使用离轴电子全息图对无偏置的Si器件进行了测试,表明在p-n结上的相变为2.8弧度。这对应于0.85V的内置电压,接近预期值,表明电子全息的真正定量性质。

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