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Automated diffraction interferometer with scatter plate

机译:带散射板的自动衍射干涉仪

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Abstract: The automated diffraction interferometer with scatter plate (DISP) is described. Special feature of the interferometer optical scheme is a special construction of an illuminator which permits to suppress speckle structure of interferometric picture. The basic part of the illuminator is a vibrating fiber bundle made from multimode optical fibers different lengths. The difference in fiber lengths overcomes the coherent length of multimode laser used as a radiation source in the interferometer. Mathematical model of DISP is presented. Mathematical model of DISP interferogram was derived from refined calculation of ray path. The model allows to evaluate errors of measurement in relation to parameters of a detail under control and size of scatter plate. It is shown that the finite size of scatter plate causes an additional phase shift. This additional phase shift we can be considered as a DISP systematic error. The procedure for calibration of DISP instrumental error is proposed. It is based on the analysis of an interferogram set made from the only optical detail under different orientation about interferometer optical axis. Experimental data on DISP error calibration is presented. DISP root mean square error is not over 0.005$lambda for detail under control with relative aperture 1:7. The production procedure of a scatter plate with uniform high aperture scattering indicatrix is described. It is based on photoregistration of coherent radiation scattered on round diffuser with central obscuration. The obscuration is performed by transparency with inverse Gauss function transmission.!11
机译:摘要:描述了一种带散射板的自动衍射干涉仪(DISP)。干涉仪光学方案的特点是照明器的特殊结构,它可以抑制干涉图像的斑点结构。照明器的基本部分是由不同长度的多模光纤制成的振动光纤束。光纤长度的差异克服了干涉仪中用作辐射源的多模激光器的相干长度。提出了DISP的数学模型。 DISP干涉图的数学模型是通过精确计算光线路径得出的。该模型允许根据散布板的控制和尺寸来评估与细节参数相关的测量误差。结果表明,散射板的有限尺寸会引起额外的相移。我们可以将这种额外的相移视为DISP系统误差。提出了DISP仪器误差的校准程序。它基于对干涉图集的分析,该干涉图集由围绕干涉仪光轴的不同方向上唯一的光学细节制成。给出了DISP误差校准的实验数据。对于相对孔径为1:7的细节,DISP均方根误差不超过0.005λ。描述了具有均匀的高孔径散射指标的散射板的生产过程。它基于散射在圆形散射体上的相干辐射的光配准,并具有中心遮挡。用反高斯函数传输通过透明度执行遮蔽。!11

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