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Process Optimization Solutions with Organic BARC

机译:有机BARC的过程优化解决方案

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摘要

Critical dimension and overall process tolerances are consistently shrinking along with resolution targets. The installation of organic bottom antireflective coatings (BARCs) into the process flow facilitates the ease with which these challenging objectives can be accomplished. An overview of the process advantages achieved with wet-developable and dry etch organic BARCs is presented and how these materials aid in the product development of nano-microtechnology devices. Using a BARC to optimize a lithography process can provide real return on investment with a much more robust process. Finally, this paper will discuss briefly how new BARC and specialty materials are brought to market.
机译:关键尺寸和整体工艺公差随着分辨率目标而不断缩小。在工艺流程中安装有机底部抗反射涂层(BARC)有助于轻松实现这些具有挑战性的目标。概述了可湿显影和干蚀刻有机BARC所获得的工艺优势,以及这些材料如何帮助纳米微技术器件的产品开发。使用BARC优化光刻工艺可以通过更强大的工艺提供真正的投资回报。最后,本文将简要讨论如何将新型BARC和特种材料推向市场。

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