首页> 外文会议>International Conference on Correlation Optics; 20030916-20030919; Chernivtsi; UA >X-ray analysis of strain relaxation in multilayer systems In_xGa_(1-x)As_(1-y)N_y/GaAs
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X-ray analysis of strain relaxation in multilayer systems In_xGa_(1-x)As_(1-y)N_y/GaAs

机译:多层系统In_xGa_(1-x)As_(1-y)N_y / GaAs的应变松弛的X射线分析

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The multilayer nano-scale systems contained one or two quantum wells In_xGa_(1-x)As_(1-y)N_y have been investigated by double-crystal X-ray diffractometry. The growth conditions, composition of initial compounds were considered. It is shown that the processes of interdiffusion of In and Ga atoms nearby the interfaces of layer with QW were took place and influenced on the properties of considered multilayer systems. The principle structural parameters of multilayered In_xGa_(1-x)As_(1-y) N_y/GaAs systems and contents of nitrogen in the quantum well and buffer layers were estimated.
机译:通过双晶体X射线衍射法研究了包含一个或两个量子阱In_xGa_(1-x)As_(1-y)N_y的多层纳米级系统。考虑了生长条件,初始化合物的组成。结果表明,In和Ga原子在层与QW的界面附近发生了相互扩散的过程,并影响了所考虑的多层体系的性能。估算了多层In_xGa_(1-x)As_(1-y)N_y / GaAs体系的基本结构参数以及量子阱和缓冲层中氮的含量。

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