首页> 外文会议>International Conference on Nitride Semiconductors(ICNS-5); 20030525-20030530; Nara; JP >High voltage GaN-based power HEMTs with field plate technique: Breakdown voltage and switching characteristics
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High voltage GaN-based power HEMTs with field plate technique: Breakdown voltage and switching characteristics

机译:采用场板技术的高压GaN基功率HEMT:击穿电压和开关特性

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摘要

We report high breakdown voltage AlGaN/GaN HEMTs using the field plate (FP) technique and demonstration of very high current density switching under high applying voltage condition. The fabricated FP-HEMT exhibited the high breakdown voltage of 594 V and achieved the high current density of 850 A/cm~2 under the high supplied voltage of 300 V. This switching current density was ten times larger than that of Si power MOSFETs.
机译:我们报告了使用场板(FP)技术的高击穿电压AlGaN / GaN HEMT,并演示了在高施加电压条件下非常高的电流密度开关。制成的FP-HEMT在300 V的高电源电压下具有594 V的高击穿电压,并实现了850 A / cm〜2的高电流密度。该开关电流密度是Si功率MOSFET的十倍。

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