首页> 外文会议>International Conference on Silicon Carbide and Related Materials 2003 pt.1(ICSCRM 2003); 20031005-20031010; Lyon; FR >The influence of recombination-induced migration of hydrogen on the formation of V_(Si)-H complexes in SiC
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The influence of recombination-induced migration of hydrogen on the formation of V_(Si)-H complexes in SiC

机译:重组诱导的氢迁移对SiC中V_(Si)-H配合物形成的影响

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In this work, the first evidence of the recombination-induced formation of hydrogen complexes with Si vacancies (V_(Si)-H) in 4H and 6H-SiC epilayers is obtained. It is established that the availability of hydrogen that is not tied up with stable complexes following plasma hydrogenation leads to the additional formation of the V_(Si)-H centers under optical excitation at low-temperatures. This process may be observed as an increase of the V_(Si)-H PL in certain types of hydrogenated samples. The PL transient is found to be a superposition of two effects: (1) the growth due to the recombination-induced formation of the corresponding defect centers; and (2) the quenching due to the transition of the V_(Si)-H centers to their metastable state.
机译:在这项工作中,获得了在4H和6H-SiC外延层中重组诱导形成具有Si空位(V_(Si)-H)的氢配合物的第一个证据。可以确定的是,等离子体氢化后没有与稳定的配合物结合的氢的可用性导致在低温光激发下V_(Si)-H中心的额外形成。在某些类型的氢化样品中,随着V_(Si)-H PL的增加,可以观察到此过程。发现PL瞬变是两个作用的叠加:(1)由于重组诱导形成的相应缺陷中心而导致的生长; (2)由于V_(Si)-H中心转变为其亚稳态而引起的猝灭。

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