AN RTP CHAMBER MODEL FOR APPARENT EMITTANCE

机译：用于表观辐射的RTP腔模型

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An optical model for an RTP chamber is developed. The model uses Monte-Carlo ray-tracing software and bi-directional distribution reflectance function (BRDF) measurements of real wafers and chamber components. A technique of using discrete rings and interpolation to minimize computational overhead is presented. The effect of enhanced emissivity due to a reflective cavity is investigated. Experimental results from wafers of varying backside emissivities are compared to modeling results to validate the model. In particular, the reflectivity of the wafers as measured by a reflectometer developed by Applied Materials is compared to in-situ measurements of emissivity. Effective emittances predicted by the model are compared with measured effective emittances inferred from oxide thickness measurements of wafers subjected to an 1100 ℃, 60 s rapid thermal oxide process.

机译：开发了用于RTP腔室的光学模型。该模型使用蒙特卡洛射线追踪软件和真实晶圆和腔室组件的双向分布反射率功能（BRDF）测量。提出了一种使用离散环和内插来最小化计算开销的技术。研究了由于反射腔而导致的发射率提高的效果。将具有不同背面发射率的晶圆的实验结果与建模结果进行比较，以验证模型。特别地，将由应用材料公司开发的反射仪测量的晶片的反射率与发射率的原位测量进行比较。将模型预测的有效发射率与从经受1100℃，60 s快速热氧化工艺的晶片的氧化物厚度测量得出的测得的有效发射率进行比较。

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《International Symposium on Rapid Thermal and Other Short-Time Processing Technologies II, Mar 24-29, 2001, Washington DC》|2001年|p.33-40|共8页
会议地点 Washington DC(US);Washington DC(US)
作者
B.E. Adams; A. Hunter;
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作者单位

Applied Materials 2727 Augustine Drive, M/S 0766 Santa Clara, CA 95060, USA;

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原文格式 PDF
正文语种 eng
中图分类无线电电子学、电信技术;
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AN RTP CHAMBER MODEL FOR APPARENT EMITTANCE

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