首页> 外文会议>International Symposium on State-of-the-Art Application of Surface and Interface Analysis Methods to Environmental Material Interactions: in Honor of James E.Castle's 65th Year, Mar 26-27, 2001, Washington D.C. >Electrochemical Ellipsometry Study on Corrosion Resistance of Fe_2O_3-Cr_2O_3 -M_xO_y (M : Valve Metals and Si) Artificial Passivation Films in Acid Solutions
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Electrochemical Ellipsometry Study on Corrosion Resistance of Fe_2O_3-Cr_2O_3 -M_xO_y (M : Valve Metals and Si) Artificial Passivation Films in Acid Solutions

机译:Fe_2O_3-Cr_2O_3 -M_xO_y(M:阀金属和Si)人工钝化膜在酸性溶液中的电化学椭圆电化学研究

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摘要

A series of Fe_2O_3-Cr_2O_3-M_xO_y (M_xO_y:Ta_2O_5, TiO_2, ZrO_2, Al_2O_3, and SiO_2) artificial passivation films, which simulate passive films on Fe-Cr-M (M:Ta, Ti, Zr, Al, and Si) alloys, were prepared on Pt substrates by ion-beam-sputter deposition (IBSD). Anodic and cathodic polarization curves of the films were measured in 1 M H_2SO_4 and 1 M HCl by a dynamic polarization method. The thinning rate of film thickness was measured in-situ by 3-parameter ellipsometry in deaerated 1 M HCl and 1 M H_2SO_4 under open circuit and potentiostatically controlled potentials. The addition of TiO_2 and Al_2O_3 to Fe_2O_3-Cr_2O_3 films did not suppress the transpassive dissolution of Cr_2O_3 of the films but the addition of ZrO_2, Ta_2O_5, and SiO_2 effectively suppressed that of Cr_2O_3 of the films. The thinning rate of Fe_2O_3-Cr_2O_3-Ta_2O_5 films at anodic potentials in 1 M HCl decreased significantly with increasing value of X_(Ta). and the Fe_2O_3-Cr_2O_3-Ta_2O_5 film with X_(Cr)=0.33 and X_(Ta)=0.40 hardly dissolved in the potential range of-0.3 V to 1.5 V. The Fe_2O_3-Cr_2O_3-SiO_2 film with X_(Cr)=0.40 and X_(Si)=0.40 did not dissolved at potentials between -0.3 V and 1.2 V but showed a slight increase in dissolution rate above 1.3 V. The electrochemical ellipsometry is a powerful method for the quantitative evaluation of corrosion resistance of artificial passivation films.
机译:一系列的Fe_2O_3-Cr_2O_3-M_xO_y(M_xO_y:Ta_2O_5,TiO_2,ZrO_2,Al_2O_3和SiO_2)人工钝化膜,可模拟Fe-Cr-M(M:Ta,Ti,Zr,Al和Si)上的钝化膜通过离子束溅射沉积(IBSD)在Pt基板上制备了各种合金。通过动态极化法在1 M H_2SO_4和1 M HCl中测量了薄膜的阳极和阴极极化曲线。在开路和恒电位控制的电势下,在脱气的1 M HCl和1 M H_2SO_4中通过3参数椭圆仪原位测量膜厚度的减薄率。在Fe_2O_3-Cr_2O_3薄膜中添加TiO_2和Al_2O_3不能抑制薄膜的Cr_2O_3的穿透溶解,但是ZrO_2,Ta_2O_5和SiO_2的添加可以有效地抑制薄膜的Cr_2O_3。随着X_(Ta)值的增加,Fe_2O_3-Cr_2O_3-Ta_2O_5薄膜在1M HCl中的阳极电势下的稀化率显着降低。 X_(Cr)= 0.33和X_(Ta)= 0.40的Fe_2O_3-Cr_2O_3-Ta_2O_5膜在-0.3 V至1.5 V的电位范围内几乎不溶解。X_(Cr)= 0.40的Fe_2O_3-Cr_2O_3-SiO_2膜X_(Si)= 0.40在-0.3 V至1.2 V之间的电势下未溶解,但在1.3 V以上的电压下溶解速率略有增加。电化学椭圆偏光法是一种定量评估人造钝化膜耐腐蚀性的有效方法。

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