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首页> 外文会议>Laser-based micro- and nanoprocessing VIII >Control of multiphoton and avalanche ionization using an ultraviolet-infrared pulse train in femtosecond laser micro-ano-machining of fused silica
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Control of multiphoton and avalanche ionization using an ultraviolet-infrared pulse train in femtosecond laser micro-ano-machining of fused silica

机译：飞秒激光熔融石英纳米微加工中使用紫外-红外脉冲序列控制多光子和雪崩电离

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摘要

We report on the experimental results of micro- and nanostructures fabricated on the surface of fused silica by a train of two femtosecond laser pulses, a tightly focused 266 nm (ultraviolet, UV) pulse followed by a loosely focused 800 run (infrared, IR) pulse. By controlling the fluence of each pulse below the damage threshold, micro- and nanostructures are fabricated using the combined beams. The resulting damage size is defined by the UV pulse, and a reduction of UV damage threshold is observed when the two pulses are within ～ 1 ps delay. The effects of IR pulse duration on the UV damage threshold and shapes are investigated. These results suggest that the UV pulse generates seed electrons through multiphoton absorption and the IR pulse utilizes these electrons to cause damage by avalanche process. A single rate equation model based on electron density can be used to explain these results. It is further demonstrated that structures with dimensions of 124 nm can be fabricated on the surface of fused silica using 0.5 NA objective. This provides a possible route to XUV (or even shorter wavelength) laser nano-machining with reduced damage threshold.
机译：我们报告了一系列飞秒激光脉冲，紧紧聚焦的266 nm（紫外线，紫外）脉冲，然后松散聚焦的800游程（红外，红外）在熔融石英表面上制造的微结构和纳米结构的实验结果。脉冲。通过将每个脉冲的能量密度控制在破坏阈值以下，可以使用组合光束制造微结构和纳米结构。最终的损坏大小由UV脉冲定义，并且当两个脉冲的延迟时间在〜1 ps以内时，可以观察到UV损坏阈值的降低。研究了红外脉冲持续时间对紫外线损伤阈值和形状的影响。这些结果表明，紫外线脉冲通过多光子吸收产生种子电子，而红外线脉冲利用这些电子通过雪崩过程造成破坏。基于电子密度的单速率方程模型可以用来解释这些结果。进一步证明，可以使用0.5 NA物镜在熔融石英表面上制备尺寸为124 nm的结构。这为降低损伤阈值的XUV（或更短波长）激光纳米加工提供了可能的途径。

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  • 来源
    《Laser-based micro- and nanoprocessing VIII》|2014年|89680G.1-89680G.8|共8页
  • 会议地点 San Francisco CA(US)
  • 作者

    Xiaoming Yu; Qiumei Bian; Zenghu Chang; P.B. Corkum; Shuting Lei;

  • 作者单位

    Industrial and Manufacturing Systems Engineering, Kansas State University, Manhattan, Kansas 66506, USA;

    Industrial and Manufacturing Systems Engineering, Kansas State University, Manhattan, Kansas 66506, USA;

    College of Optics Photonics and Department of Physics, University of Central Florida, Orlando, Florida 32816, USA;

    National Research Council of Canada, Ottawa, Ontario K1A 0R6, Canada,University of Ottawa, Ottawa, Ontario K1N 6N5, Canada;

    Industrial and Manufacturing Systems Engineering, Kansas State University, Manhattan, Kansas 66506, USA;

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  • 正文语种 eng
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