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The feature of laser deposition of polymeric composite films from an active gas phase

机译：从活性气相激光沉积聚合物复合膜的特征

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摘要

The organic-silicon films, polytetrafluorethylene (PTFE) films and its composite films with copper have been fabricated from an active gas phase by pulse laser dispersion from initial powder species. The features of all films obtained were studied with the application of attenuated total reflection-Fourier transform infrared (ATR-FTIR) spectroscopy. Our results suggest that the wavelength of laser radiation impact a strong effect on the molecular structure of all films. Specifically, the peaks corresponding to the detachment of C-H bonds in the organic-silicon films and its Cu doped films at a laser wavelength of 532 nm and the destruction of the Si-O-Si groups at 266 nm due to the ultraviolet radiation have been observed. Interestingly, the concentration of Si-C_6H_5 groups relative increases with a decremental of the wavelength of laser radiation. In addition, the PTFE films formed at a laser wavelength of 355 nm presented a lower order degree and high amorphous phase, while PTFE-Cu composite films at laser wavelength 266 nm exhibited enhanced crystallinity due to the presence of copper species, wherein being served as nucleation centers. Remarkably, the wavelengths of laser radiation nearly play no effect on the orderness of PTFE-Cu composite films.
机译：有机硅膜，聚四氟乙烯（PTFE）膜及其与铜的复合膜是由活性气相通过从初始粉末物质中进行脉冲激光分散而制成的。使用衰减全反射-傅立叶变换红外光谱（ATR-FTIR）光谱研究了获得的所有薄膜的特性。我们的结果表明，激光辐射的波长对所有薄膜的分子结构都有很大影响。具体而言，在532nm的激光波长下，对应于有机硅膜及其掺杂Cu的膜中的CH键的脱离的峰，以及由于紫外线辐射导致的266nm下的Si-O-Si基团的破坏是峰。观测到的。有趣的是，Si-C_6H_5基团的浓度随激光辐射波长的减少而相对增加。此外，在355 nm激光波长下形成的PTFE膜呈现较低的阶数和高非晶相，而在266 nm激光波长下的PTFE-Cu复合膜由于铜的存在而增强了结晶度，其中成核中心。值得注意的是，激光辐射的波长几乎不影响PTFE-Cu复合膜的有序性。

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