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A novel simple shallow trench isolation (SSTI) technology using high selective CeO/sub 2/ slurry and liner SiN as a CMP stopper

机译：一种新颖的简单浅沟槽隔离（SSTI）技术，使用高选择性CeO / sub 2 /浆料和衬里SiN作为CMP塞

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A novel simple shallow trench isolation technology, SSTI, has been developed. SSTI consists of direct trench etching masked only with the photoresist, trench oxidation, liner SiN deposition, CVD oxide trench fill, densification, and high selectivity CMP. CMP stops at the liner SiN with a residual SiN thickness range of less than 2 nm and without micro-scratching. High selectivity CMP eliminates the field recess variation which is one of the drawbacks of conventional STI. SSTI is a promising candidate for future isolation technology.

机译：已经开发出一种新颖的简单浅沟隔离技术SSTI。 SSTI仅由光致抗蚀剂，沟槽氧化，衬垫SIN沉积，CVD氧化物沟槽填充，致密化和高选择性CMP掩蔽的直接沟槽蚀刻。 CMP在衬垫的衬垫中停止，残留的SIN厚度范围小于2nm，没有微刮擦。高选择性CMP消除了作为传统STI的缺点之一的场凹陷变化。 SSTI是未来隔离技术的有希望的候选者。

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《》|1999年|P.159-160|共2页
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Park; T.; Kim; J.Y.;
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中图分类无线电电子学、电信技术;
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1. Influence of High Selectivity Slurry in Shallow Trench Isolation CMP on Junction Leakage Characteristics [J] . Il Young Yoon, Jong Yeul Jeong, Young Bae Park Electrochemical and solid-state letters . 2002,第4期

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2. Nanotopography Impact and Non-Prestonian Behavior of Ceria Slurry in Shallow Trench Isolation Chemical Mechanical Polishing (STI-CMP) [J] . Takeo KATOH, Min-Seok KIM, Ungyu PAIK, Japanese Journal of Applied Physics. Part 1, Regular Papers & Short Notes . 2004,第2A期

机译：浅沟槽隔离化学机械抛光（STI-CMP）中二氧化铈浆料的纳米形貌影响和非Prestonian行为
3. Effect of Molecular Weight of Surfactant in Nano Ceria Slurry on Shallow Trench Isolation Chemical Mechanical Polishing (CMP) [J] . Hyun-Goo KANG, Takeo KATOH, Myung-Yoon LEE, Japanese Journal of Applied Physics. Part 2, Letters . 2004,第8B期

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4. A novel simple shallow trench isolation (SSTI) technology using high selective CeO{sub}2 slurry and liner SiN as a CMP stopper [C] . T. Park, J. Y. Kim, K. W. Park, Symposium on VLSI Technology . 1999

机译：一种新颖的简单浅沟渠隔离（SSTI）技术，使用高选择性首席执行官{Sub} 2浆料和衬垫作为CMP塞子
5. Characterization of advanced shallow trench isolation (STI) CMP processes and consumables. [D] . Burkhard, Craig D. 2007

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6. Selective medium for isolation of Fusarium species and dematiaceous hyphomycetes from cereals. [O] . S Andrews, J I Pitt 1986

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7. Fill for shallow trench isolation CMP [O] . Andrew B. Kahng, Puneet Sharma, Alexander Zelikovsky 2013

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A novel simple shallow trench isolation (SSTI) technology using high selective CeO/sub 2/ slurry and liner SiN as a CMP stopper

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