Preparation of Epitaxial LiNbO_3 Thin Film by MOCVD and Its Properties

机译：MOCVD制备外延LINBO_3薄膜及其性质

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Lithium niobate (LiNbO_3) thin films were deposited on Al_2O_3(001) substrates using metal-organic chemical vapor deposition (MOCVD), with Li(dpm) and Nb(C_2H_5)_5 as precursors. By optimizing the conditions of thin film deposition, the c-axis oriented and epitaxially grown LiNbO_3 thin films with stoichiometric composition were deposited on an Al_2O_3(001) substrate. The refractive index of the stoichiometric LiNbO_3 thin film was 2.24 at λ= 632.8 nm, which is close to that of bulk crystal.

机译：使用金属 - 有机化学气相沉积（MOCVD），用Li（DPM）和Nb（C_2H_5）_5作为前体沉积铌酸锂（LINBO_3）薄膜沉积在Al_2O_3（001）衬底上。通过优化薄膜沉积的条件，沉积在Al_2O_3（001）衬底上沉积具有化学计量组合物的C轴和外延生长的LINBO_3薄膜。化学计量LiNBO_3薄膜的折射率为2.24，λ= 632.8nm，接近散装晶体的折射率。

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《Electronics Division Meeting of the Ceramic Society of Japan》|2009年||共4页
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中图分类电工陶瓷材料;
关键词
LiNbO_3; MOCVD; thin film; epitaxial film; optical property; refractive index;

机译：linbo_3;MOCVD;薄膜;外延膜;光学性质;折射率;

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3. In-plane lattice parameter determination of Zn: LiNbO_3 thin films epitaxially grown on x-cut LiNbO_3 substrates using X-ray diffraction methods [J] . J. Kraeusslich, C. Dubs, A. Lorenz, Physica Status Solidi. A, Applications and Materials Science . 2007,第8期

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Preparation of Epitaxial LiNbO_3 Thin Film by MOCVD and Its Properties

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