首页> 外文会议>Society of Vacuum Coaters annual technical conference >Single Sided Ultra-Barrier Oxide Films on Flexible Substrates, Deposited Using High Speed Atomic Layer Deposition Based on Substrate Translation
【24h】

Single Sided Ultra-Barrier Oxide Films on Flexible Substrates, Deposited Using High Speed Atomic Layer Deposition Based on Substrate Translation

机译:基于衬底平移的高速原子层沉积法沉积柔性衬底上的单面超栅氧化膜

获取原文

摘要

Atomic Layer Deposition (ALD) has recently emerged as an excellent candidate for producing high quality single-layer vapor barrier films on flexible substrates. Recent developments in ALD based on the movement of the substrate to provide alternating precursor exposure, rather than on alternating pulses into a common volume, have shown promise of providing a mechanism for high rate, high volume deposition onto flexible substrates. In this study, single-sided films of TiO_2 and Al_2O_3 have been deposited on inexpensive, commercial grade PET films without smoothing layers, using ALD based on transport of the substrate between zones containing metal precursors and oxygen-containing plasma. The Water Vapor Transmission Rate of these films has been characterized using a MOCON Aquatran system, demonstrating ultra-barrier performance, below the instrument sensitivity limit of 5e-4 gm/m~2/day for films as thin as 20 nm, deposited at web speeds in excess of 12 meters per minute. Implications for scaling of the process to full roll-to-roll large area deposition are also discussed.
机译:原子层沉积(ALD)最近已成为在柔性基板上生产高质量单层防潮膜的理想选择。基于衬底的运动以提供交替的前体暴露而不是基于交替脉冲进入共同体积的ALD的最新发展已经显示出提供为高速率,大体积沉积到柔性衬底上的机制的希望。在这项研究中,基于基底在含金属前驱物和含氧等离子体的区域之间的传输,使用ALD将TiO_2和Al_2O_3的单面膜沉积在便宜的商业级PET膜上,而没有平滑层。这些膜的水蒸气透过率已使用MOCON Aquatran系统进行了表征,表现出超阻隔性能,低于20e厚薄膜沉积在卷筒纸上时的仪器灵敏度极限5e-4 gm / m〜2 / day。速度超过每分钟12米。还讨论了将工艺规模扩展为全面卷对卷大面积沉积的含义。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号