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首页> 外文会议>Society of Vacuum Coaters annual technical conference >A New Generation of Plasma-Based Electron Beam Sources with High Power Density as a Novel Tool For High-Rate PVD
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A New Generation of Plasma-Based Electron Beam Sources with High Power Density as a Novel Tool For High-Rate PVD

机译：新一代基于等离子体的高功率密度电子束源，作为高速率PVD的新型工具

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摘要

Electron beam sources with cold cathodes which can emit secondary electrons upon stimulation by a high-voltage glow-discharge have recently be reported to provide an economically attractive alternative to conventional thermionic electron beam guns. This paper introduces a new generation of discharge-based electron beam sources which combine the simplicity of known cold cathode devices with beneficial performance parameters reached so far with traditional thermionic electron sources only. The cathode of these new guns consists of a material that is capable of secondary as well as of thermionic electron emission, whereas an elevated work temperature is maintained by ions extracted from a high-voltage glow-discharge. This so called "hybrid cathode" mode ofbeam generation shows interesting physical behavior and technically advantageous features.
机译：最近已经报道了具有冷阴极的电子束源，当受到高压辉光放电的刺激时，该电子束源可以发射二次电子，从而为传统的热电子束枪提供了经济上有吸引力的替代方案。本文介绍了新一代的基于放电的电子束源，它结合了已知的冷阴极器件的简单性和迄今为止仅使用传统的热电子源所能达到的有益性能参数。这些新枪的阴极由能够二次发射和热电子发射的材料组成，而从高压辉光放电中提取的离子可保持较高的工作温度。光束的这种所谓的“混合阴极”模式显示出令人感兴趣的物理行为和技术上有利的特征。

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