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首页> 外文会议>Society of Vacuum Coaters annual technical conference >Cr-W-C-N Nanocomposite Coatings via Reactive Magnetron Sputtering
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Cr-W-C-N Nanocomposite Coatings via Reactive Magnetron Sputtering

机译：反应磁控溅射Cr-W-C-N纳米复合涂层

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While binary tungsten carbide can form smooth, hard films, these suffer from low fracture toughness. Tungsten nitride films are frequently harder, but are more brittle. Chromium nitride has excellent wear and oxidation resistance, but films often form with low hardness. Composites of these binary compounds offer a possibility to tailor the material for a desired combination of properties. To this end, we have used reactive RF-magnetron sputtering with Cr and WC targets to form quaternary composites, with nitrogen as the reactive gas. The coatings were deposited on Si, Ti, and steel substrates. The nitrogen partial pressure was varied to investigate the relationship between the film properties and the deposition conditions. Energy dispersive spectroscopy showed changes in the chemical composition as a result of the change in nitrogen partial pressure. X-ray diffraction illuminated the structure as either a solid solution with a Bl NaCl structure, or a nanocomposite with the average crystallite size under 11 nm. Optical interferometer revealed low compressive stresses. And nanoindentation established that the films are hard and adherent.
机译：虽然二元碳化钨可以形成光滑，坚硬的膜，但它们的断裂韧性低。氮化钨膜通常较硬，但较脆。氮化铬具有出色的耐磨性和抗氧化性，但通常形成的膜硬度低。这些二元化合物的复合物提供了将材料定制为所需特性组合的可能性。为此，我们使用了具有Cr和WC靶的反应性RF磁控溅射技术，以氮气为反应性气体，形成了四元复合材料。涂层沉积在Si，Ti和钢基底上。改变氮气分压以研究膜性能与沉积条件之间的关系。能量色散光谱法表明，由于氮分压的变化，化学成分也发生了变化。 X射线衍射将该结构照亮为具有B1 NaCl结构的固溶体，或者是平均晶粒尺寸在11nm以下的纳米复合材料。光学干涉仪显示出较低的压应力。纳米压痕证明该膜坚硬且粘附。

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