首页> 外文会议>THERMEC 2011;International conference on processing manufacturing of advanced materials >Coatings of Ti and TiO2 with Defined Roughness for Implants by Gas Flow Sputtering
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Coatings of Ti and TiO2 with Defined Roughness for Implants by Gas Flow Sputtering

机译:通过气流溅射对植入物进行粗糙度限定的Ti和TiO2涂层

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High rate film deposition via Gas Flow Sputtering was used to develop both metallic titanium films and ceramic titania coatings for implants. The structure formation of the coatings can be described by a modified model of structure zones according to Thornton. The potential of Gas Flow Sputtering for designing implant surfaces with controlled morphology and roughness is demonstrated.
机译:通过气流溅射的高速率薄膜沉积被用于开发金属钛薄膜和用于植入物的陶瓷二氧化钛涂层。涂层的结构形成可以根据桑顿的结构区域的改进模型来描述。展示了气流溅射在设计具有受控形态和粗糙度的植入物表面方面的潜力。

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