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Isolation and characterization of large-area GaSb membranes grown on GaAs substrates

机译:在GaAs衬底上生长的大面积GaSb膜的分离和表征

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We investigate substrate removal techniques for GaSb epilayers grown on GaAs substrates. The GaSb epilayers are grown metamorphically on the GaAs substrate by inducing large areas of 90° interfacial misfit dislocation arrays at the GaSb/GaAs interface. Three structures have been investigated, each with a different etch stop process such that the GaAs substrate is removed without affecting the GaSb epi-layer. The GaSb membranes upon isolation are characterized for crystal quality using x-ray diffraction and for surface quality using atomic force microscopy.
机译:我们研究了生长在GaAs衬底上的GaSb外延层的衬底去除技术。通过在GaSb / GaAs界面处诱导大面积的90°界面失配位错阵列,GaSb外延层在GaAs衬底上变质生长。已经研究了三种结构,每种结构具有不同的蚀刻停止工艺,从而可以在不影响GaSb外延层的情况下去除GaAs衬底。分离后的GaSb膜的特征是使用X射线衍射的晶体质量和表面质量的原子力显微镜。

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