By generating supplementary patterns for EB data and using a system that corrects pattern line widths, we improved the shape (corner round) of a pattern formed on a photomask and the CD (critical dimension) - linearity. For the EB lithography system, trapezoidal and hammerhead supplementary patterns were applied in order to suppress the increase in EB data volume. As a result, it became possible to reduce the supplementary patterns generated to about 60percent of the existing serif supplementary patterns. The formed pattern shapes were also equivalent. Since the laser lithography system (ALTA3000) requires bigger correction pattern shapes than the EB lithography system (MEBES4500), triangle supplementary patterns were used. As a result, the corner round was improved with the number of patterns equivalent to that of existing rectangle supplementary patterns.
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