Spray Developer for ZEP7000

机译：喷雾开发人员为Zep7000

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摘要

ZEP7000 has been successfully used as EB resist for high-end photomask manufacturing where high dry etching resistance, high sensitivity and high resolution are required. zED-500 is the common developer used in spray development process and ZED- 750 for puddle development process.

机译：Zep7000已成功用作高端光掩模制造的EB抗蚀剂，其中需要高干蚀刻性，高灵敏度和高分辨率。 ZED-500是用于喷雾开发过程和ZED-750用于水坑开发过程的普通开发人员。

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来源
《Conference on photomask and next-generation lithography mask technology》|2000年||共9页
会议地点
作者
Atsushi Kawata; Kakuei Ozawa; Nobunori Abe; SPIE-The International Society for Optical Engineering;
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原文格式 PDF
正文语种
中图分类摄影机具与设备;
关键词
EB resist; ZEP7000; ZED-450; ZED-500; spray development; development time;

机译：EB抗蚀;ZEP7000;ZED-450;ZED-500;喷雾开发;发展时间;

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4. Spray Developer for ZEP7000 [C] . Atsushi Kawata, Kakuei Ozawa, Nobunori Abe Conference on photomask and next-generation lithography mask technology . 2000

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Spray Developer for ZEP7000

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