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首页> 外文会议>Conference on photomask and next-generation lithography mask technology >Development of photomask process with precise CD control, and an approach for DFM (Defect Free Manufacturing) using a cluster tool
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Development of photomask process with precise CD control, and an approach for DFM (Defect Free Manufacturing) using a cluster tool

机译：使用群集工具开发精确CD控制的光掩模过程，以及DFM（缺陷无缺陷制造）的方法

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摘要

Specifications for advanced photomasks are becoming more and more stringent as the industry shifts to smaller lithography nodes. Among various requirements for photomasks, the need for stringent mean to target (MTT) control of critical dimensions (CDs) as well as the reduction of defects is the hottest issue for current photomask manufacturers. In this paper a unique photomask manufacturing method for precise CD-MTT control is described and an approach to defect free manufacturing (DFM) is also proposed. In the new method, a two-step compensation to cancel CD errors is adopted. its essence is the selection of metrology tools used in each step. An MTT of +/-5nm is achieved using this method. For DFM, a cluster tool, combining the processing tools with each other by a robot handler, has been installed and avoiding human handling is proved to be a correct way.
机译：随着行业转移到较小的光刻节点，高级光学掩模的规范变得越来越严格。在对光掩模的各种要求中，对临界尺寸（CDS）的严格意义（MTT）控制以及缺陷的减少是当前光掩模制造商的最热门问题。在本文中，描述了一种用于精确CD-MTT控制的独特的光掩模制造方法，并且还提出了一种缺陷制造（DFM）的方法。在新方法中，采用了取消CD错误的两步补偿。其本质是在每一步中使用的计量工具。使用此方法实现了+/- 5nm的MTT。对于DFM，已经安装并避免了由机器人处理程序组合彼此的群集工具，并避免人类处理被证明是正确的方法。

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