Reticle Inspection System Using DUV Wavelength and New Algorithm Platform for Advanced Reticle Inspection for 0.13 Micron Technology Node

机译：用DUV波长和新的算法平台进行掩模版检验系统，为0.13微米技术节点进行高级掩模版检查

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KLA-Tencor has developed a fourth-generation reticle inspection system, the KLA-Tencor 570, using DUV imaging to detect 100-nm defects on advnaced OPC and PSM reticles for the 0.13 micron technology node production and 0.10 micron technology development. This system contains innovations in optics, electronics, mechanics, algorithms, and software.

机译：KLA-Tencor开发了第四代掩模版检验系统，KLA-Tencor 570，使用DUV成像，以检测AdvNaced OPC和PSM晶粒的100nm缺陷，用于0.13微米技术节点生产和0.10微米技术开发。该系统包含光学，电子，机械，算法和软件的创新。

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《Conference on photomask and next-generation lithography mask technology》|2000年||共10页
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D. Alles; P. Ter Beek; S. Juang; J. Wiley; K. Hsia; SPIE-The International Society for Optical Engineering;
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1. Phase enhanced DUV inspection of alternating phase shift reticles [J] . Larry Zurbrick, Maciej Rudzinski, Long He, European Semiconductor . 2004,第2期

机译：交替相移掩模版的相增强DUV检查
2. METHOD FOR RETICLE PARTICLE DETECTION USING A STRUCTURAL ILLUMINATION INSPECTION SYSTEM WITH APERTURE APODIZATION [J] . Research Disclosure . 2021,第688期

机译：使用具有孔径偏移的结构照明检查系统的掩模罩粒子检测方法
3. False Alarm Reduction in Reticle Inspection Using Machine Learning Approaches [J] . Research Disclosure . 2020,第673期

机译：使用机器学习方法的掩模版检验误报减少
4. Reticle Inspection System Using DUV Wavelength and New Algorithm Platform for Advanced Reticle Inspection for 0.13 Micron Technology Node [C] . D. Alles, P. Ter Beek, S. Juang, Conference on photomask and next-generation lithography mask technology . 2000

机译：使用DUV波长和新算法平台的光罩检测系统，用于0.13微米技术节点的高级光罩检测
5. Multi-robot systems: Modeling swarm dynamics and designing inspection planning algorithms. [D] . Williams, Kjerstin Irja. 2006

机译：多机器人系统：为群体动力学建模并设计检查计划算法。
6. Uninformative Biological Variability Elimination in Apple Soluble Solids Content Inspection by Using Fourier Transform Near-Infrared Spectroscopy Combined with Multivariate Analysis and Wavelength Selection Algorithm [O] . Lin Zhang, Baohua Zhang, Jun Zhou, 2017

机译：傅里叶变换近红外光谱结合多元分析和波长选择算法消除苹果可溶性固形物含量的非信息性生物变异性
7. Amplitude and phase defect inspection on EUV reticles using RESCAN [O] . Iacopo Mochi, Sara Fernandez, Ricarda Nebling, 2019

机译：使用Rescan对EUV掩模术的幅度和相位缺陷检查
8. EUV Inspection of Reticle Defect Repair Sites [R] . Goldberg, K. 2007

机译：EUV检查光罩缺陷修复站点

Reticle Inspection System Using DUV Wavelength and New Algorithm Platform for Advanced Reticle Inspection for 0.13 Micron Technology Node

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