Development of photomask processwith precise CD control, and an approach for DFM (Defect Free Manufacturing) using a cluster tool

机译：Photomask Process的开发精确CD控制，以及使用群集工具的DFM（无缺陷制造）的方法

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摘要

Specifications for advanced photomasks are becoming more and more stringent as the i8ndustry shifts to smaller lithography nodes. Among various requirements for photomasks, the need for stringent mean to target (MTT) control of critical dimensions (CDs) as well as the reduction of defects is the hottest issue for current photomask manufacturers.

机译：由于I8NDustry转移到较小的光刻节点，所以对高级光掩模的规范变得越来越严格。在对光掩模的各种要求中，对临界尺寸（CDS）的严格意义（MTT）控制以及缺陷的减少是当前光掩模制造商的最热门问题。

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《Conference on photomask and next-generation lithography mask technology》|2000年||共10页
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Shiho Sasaki; Toshifumi Yokoyama; Masa-aki Kurihara; Hiroyuki Miyashita; Naoya Hayashi; Hisatake Sano; SPIE-The International Society for Optical Engineering;
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原文格式 PDF
正文语种
中图分类摄影机具与设备;
关键词
photomask; CD control; CD measurement; defect free manufacturing;

机译：Photomask;CD控制;CD测量;免费制造业;

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Development of photomask processwith precise CD control, and an approach for DFM (Defect Free Manufacturing) using a cluster tool

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