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首页> 外文会议>Conference on photomask and next-generation lithography mask technology >Improvement of Critical Dimension Stability of Chemically Amplified Resist by Overcoat
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Improvement of Critical Dimension Stability of Chemically Amplified Resist by Overcoat

机译：通过外涂层改善化学放大抗蚀剂的临界尺寸稳定性

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The critical dimensions (CD) change by the process delay is the most critical issue to use the chemically amplified resists (CAR) for photomask fabrication. In the photo-mask fabrication processes, the resist should have both post coating delay (PCD) and post exposure delay (PED) stability, while keeping higher sensitivity. To achieve this requirement, overcoat process has been examined for the purpose of CD stabilization in CAR process for photomask manufacture. The material, which consists of hydrophobic polymer and photo acid generator (PAG), was used for the overcoat in this study. It has been proved that the overcoat shows the effect of controlling CD change, and applying the overcoat does not generate a fatal number of defects and pinholes. From these results, it is thought that the overcoat process is promising for the size stabilization in photomask manufacture for 100 nm devices.
机译：通过过程延迟的临界尺寸（CD）改变是使用用于光掩模制​​造的化学放大抗蚀剂（汽车）的最关键问题。在光掩模制造工艺中，抗蚀剂应具有后涂层延迟（PCD）和曝光后延迟（PED）稳定性，同时保持更高的灵敏度。为实现这一要求，已经研究了过涂层的方法，目的是CD稳定在用于光掩模制​​造的汽车过程中。由疏水性聚合物和光酸发生器（PAG）组成的材料用于本研究的外涂层。已经证明，外涂层显示了控制CD变化的效果，并施加外涂层不会产生致命的缺陷和针孔。从这些结果来看，据认为，外涂层的尺寸稳定在光掩模制造中稳定100nm器件。

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