Pall Microelectronics has used blowback filtration to protect a CVD vacuum installation at an European semiconductor fab. In cyclic regenerating blowback filtration, a powder cake builds up on the filter element and is periodically removed by gas blowback. In this application, the filter successfully removed SiOx particles formed in the foreleg of the pump. The reliability of the system is mainly dependent on the valves. They must repeatedly operate under harsh process conditions.
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