Nanoparticle reduction in Cu CMP for 20nm node and beyond

机译：Cu CMP的纳米颗粒减少至20nm及更高

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A high yield copper damascene process requires defect-free copper surfaces after Cu CMP. In this paper we present a novel technique to improve cleaning efficiency, especially the removal of particles in the range of 20 to 80nm. This innovative Chemical Mechanical Cleaning (CMC) approach is validated with defect density reduction and a significant reduction of electrical shorts measured on test wafers.

机译：高产量的铜镶嵌工艺需要在Cu CMP之后实现无缺陷的铜表面。在本文中，我们提出了一种新颖的技术来提高清洁效率，尤其是去除20至80nm范围内的颗粒。这种创新的化学机械清洗（CMC）方法通过减少缺陷密度和显着减少在测试晶圆上测量的电短路而得到验证。

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《Annual SEMI Advanced Semiconductor Manufacturing Conference》|2015年|1-5|共5页
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作者
Jeanjean Damien; Robin Olivier; Sramek Rurh; Mermoz Sebastien; Ducotey Gregoire; Gaillard Sebastien; Yufei Chen; Pitard Frederic; Nicoud Laurent; Brown Brian;
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CMP Process; Chemical Mechanical Cleaning; Copper Cleaning; Defect Control; Nanoparticle Detection;

机译：CMP工艺;化学机械清洗;铜清洗;缺陷控制;纳米颗粒检测;

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2. 溶液中制备Cu2O@Cu2O核壳纳米颗粒及其向Cu2O@Cu核壳纳米颗粒的转化（英文） [J] . 杨爱玲, 李顺嫔, 王玉金, 中国有色金属学报：英文版 . 2015,第011期
3. The immobilized Cu nanoparticles on magnetic montmorillonite (MMT@Fe3O4@Cu): As an efficient and reusable nanocatalyst for reduction and reductive-acetylation of nitroarenes with NaBH4 [J] . Zeynizadeh Behzad, Rahmani Soleiman, Tizhoush Hengameh Polyhedron: The International Journal for Inorganic and Organometallic Chemistry . 2020,第期

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4. In situ characterization of Cu CMP slurry and defect reduction using IR thermal camera [J] . Chia-Hao Chan, Jem Kun Chen, Feng-Chih Chang Microelectronic Engineering . 2004,第3期

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机译：生长和全生长金属纳米粒子催化还原水溶液和微环境中的硝基化合物
6. Nanoparticle reduction in Cu CMP for 20nm node and beyond [C] . Jeanjean Damien, Robin Olivier, Sramek Rurh, Annual SEMI Advanced Semiconductor Manufacturing Conference . 2015

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7. Experimental and molecular dynamics studies in copper electro chemical mechanical polishing (Cu-ECMP). [D] . Kandasamy Arulmozhi, Anant. 2013

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9. Cu and Cu2In nanoparticles supported on amorphised zeolitesudfor the selective reduction of biomass derived carboxylic acids to alcoholsud [O] . Harnos Szabolcs, Onyestyák György, Kalló Dénes 2012

机译：负载在非晶沸石上的Cu和Cu2In纳米粒子用于将生物质衍生的羧酸选择性还原为醇 ud

Nanoparticle reduction in Cu CMP for 20nm node and beyond

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