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Control for Au-Ag Nanoporous Structure by Electrodeposition and Dealloying

机译：电沉积和脱合金控制Au-Ag纳米多孔结构

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We investigated the composition, morphology, and dissolution behavior of an Au-Ag nanoporous structure formed by electrodeposition and dealloying. Formation of the films was carried out by changing the bath composition and the annealing temperature. The amount of Ag decreased from 70 wt. % to 45-50 wt. % after dealloying. As seen from analysis by a glow discharge optical emission spectrometer (GDOES), not only the amount of Ag, but also that of Au was decreased after dealloying, and a highly concentrated Ag layer was generated at the surface. When the Ag dissolves, an underpotential deposition (UPD) might be introduced, followed by the generation of a high concentration of Ag. From the anodic polarization measurement, the anodic current densities of the samples under 1.5 V were larger than those of the samples under 1.0 V, resulting in the generation of many nanopores. It was confirmed that dealloying involved three processes: whole film dissolution (includes Au dissolution), defects dissolution at the grain boundary, and Ag-selective dissolution.
机译：我们研究了通过电沉积和脱合金形成的Au-Ag纳米多孔结构的组成，形态和溶解行为。通过改变浴液组成和退火温度来进行膜的形成。 Ag的量从70重量％减少。 ％至45-50 wt。解除雇佣后的百分比。从辉光放电光发射光谱仪（GDOES）的分析可以看出，脱合金后不仅Ag的量减少，而且Au的量减少，并且在表面上产生了高度浓缩的Ag层。当银溶解时，可能会引入电位不足沉积（UPD），然后生成高浓度的银。通过阳极极化测量，在1.5V下的样品的阳极电流密度大于在1.0V下的样品的阳极电流密度，导致产生许多纳米孔。已确认脱合金涉及三个过程：整个膜溶解（包括金溶解），晶界处的缺陷溶解和银选择性溶解。

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