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SEMI standards programmed defect masks and their a

机译：SEMI标准编程的缺陷掩膜及其

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Abstract: A set of test masks on which programmed defects are placed has been standardized by SEMI (SEMI Standards P23-93). The masks have been designed to be used for benchmarking the sensitivity of defect inspection systems for reticles and masks. The standard test vehicles consist of two types of masks which have quasi device background patterns (contact holes or through-holes and wiring patterns) with a wide variety of programmed defects. The geometry of the background patterns on the masks have been designed for 0.5 $mu@m or less when printed on a wafer with a 5x reduction stepper. Under the coordination of SEMI Japan, the test masks have experimentally been fabricated by a couple of Japanese mask shops, and the masks fabricated have been evaluated focusing on defect sizing accuracy. The mask which has holes as background pattern has been used for defect printability study using a 5x reduction i-line stepper. As a result, it has been confirmed that the test mask is a useful vehicle for the study. The standard masks, therefore, can also be used to make a standard defect spec on which mask suppliers and user agree.!6
机译：摘要：SEMI已对一组放置有编程缺陷的测试掩模进行了标准化（SEMI标准P23-93）。掩模被设计用于基准测试标线和掩模缺陷检测系统的灵敏度。标准测试工具由两种类型的掩膜组成，这些掩膜的准器件背景图案（接触孔或通孔和布线图案）带有多种编程缺陷。当使用5倍减径步进器在晶圆上印刷时，掩模上背景图案的几何形状设计为0.5μm或更小。在日本SEMI的协调下，测试掩模由几个日本掩模厂进行了实验制造，并且所制造的掩模已针对缺陷尺寸的准确性进行了评估。具有孔洞作为背景图案的掩膜已用于使用5倍还原i线步进器进行缺陷可印刷性研究。结果，已经证实测试面罩是用于研究的有用载体。因此，标准面罩还可以用于制定标准缺陷规范，以供面罩供应商和用户同意。！6

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