首页> 外文会议>Photomask and X-Ray Mask Technology II >Mask-/reticle-making control system
【24h】

Mask-/reticle-making control system

机译:口罩/光罩制作控制系统

获取原文

摘要

Abstract: The mask making is the first step in the semiconductor device manufacturing. It depends entirely upon mask delivery time whether it will take a short time or not to develop and produce the new devices. It is required to construct the system which can manage mask making and delivery quickly. It is very important to control the much various information on the many kinds of the mask for ASIC use quickly. It is also important to control the many various masks processing parameters, that is, to memorize the parameters and to use the appropriate parameters when the masks for general purpose device like a memory use are revised. The data base system to control the various information and parameters is requested from many mask makers and device ones. We have made a unitary data base including a large amount of information on the various ASIC devices and the various processing parameters of the memory devices, and information on the mask making progress, whereabouts of the masks. And we have constructed the new mask/reticle making control system using with the database.!0
机译:摘要:掩模的制造是半导体器件制造的第一步。开发和生产新设备是否需要很短的时间,完全取决于掩模的交付时间。需要构建可以快速管理口罩制作和交付的系统。快速控制用于ASIC的多种掩模上的多种信息非常重要。控制许多不同的掩膜处理参数,也就是记住这些参数,并在修改通用设备(如存储器使用)的掩膜时,使用适当的参数也很重要。许多掩模制造商和设备制造商都要求控制各种信息和参数的数据库系统。我们已经建立了一个统一的数据库,其中包含有关各种ASIC设备和存储设备的各种处理参数的大量信息,以及有关掩模制造进度,掩模下落的信息。并且我们已经使用数据库构建了新的光罩/掩模版制作控制系统。!0

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号